Projects of the Electron beam lithography department VEGA – Scientific Grant Agency of SR and SAS
GAV – Grant Agency for Science
COPERNICUS – European Communities
ASFEU – Agency of SR for EU Structural Funds
SRDA – Agency for research&development support
MAD – Inter-academic agreement

Actual and recent projects:

Finished projects:

Innovation of sub-micrometer electron beam lithography
Inovácia sub-mikrometrovej elektrónovej litografie
Program: Bilateral – other
Project leader: RNDr. Kostič Ivan
ID: SK-BUL-010-06
Duration: 1.1.2007 – 31.12.2009
Web page: http://www.ie-bas.dir.bg/Departments/Beamtech.htm
Annotation
Molecular-friendly processes for fabrication of molecular electronic devices
Kompatibilné molekulárne procesy pre prípravu molekulárnych elektronických obvodov
Program: Bilateral – other
Project leader: RNDr. Kostič Ivan
ID: SK-GR-047-11
Duration: 1.1.2013 – 31.12.2014
Annotation
Correlation of structure and magnetism in novel nanoscale magnetic particles
Korelácia štruktúry a magnetických vlastností nových magnetických nano častíc
Program: FP5
Project leader: RNDr. Kostič Ivan
ID: 150
Duration: 1.3.2000 – 31.7.2004
Web page: http://agfarle.uni-duisburg.de/RTN
Annotation
Radical Innovation Maskless Nanolithography
Radikálna inovácia bezmaskovej nanolitografie
Program: FP6
Project leader: RNDr. Kostič Ivan
ID: 17133
Duration: 1.10.2005 – 30.9.2008
Web page: www.rimana.org, http://cordis.europa.eu/fetch?CALLER=FP6_PROJ=D=74659=1=PROJ=14
Annotation
Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthesis
Technológia výroby matice paralelných inteligentných nosníkov –sondových platform pre analýzu a syntézu v nanometrovej oblasti
Program: FP6
Project leader: RNDr. Kostič Ivan
ID: 515739
Duration: 1.4.2005 – 30.9.2010
Web page: www.pronano.org
Annotation
Nano-structuring by Electron Beam Lithography for Sensor Application
Tvarovanie štruktúr pre senzorové aplikácie s využitím elektrónovej litografie
Program: Bilateral – other
Project leader: RNDr. Kostič Ivan
ID: APVV SK-BG-2013-0030
Duration: 9.5.2016 – 31.12.2017
Annotation
Robust Lithography of Submicron nad Nano-dimensional Structures
Výkonná litografia submikrometrových a nanometrových štruktúr
Program: Bilateral – other
Project leader: RNDr. Kostič Ivan
ID: SK-BG-0037-10
Duration: 1.1.2012 – 31.12.2013
Annotation
Study of electron beam resists and patterning of nano-structures by electron beam lithography for gas sensor applications
Výskum elektrónových rezistov a príprava nanoštruktúr s využitím elektrónovej litografie vo výskume senzorov plynu
Program: Inter-academic agreement
Project leader: RNDr. Kostič Ivan
ID: JRP SAS-BAS 2015-2017
Duration: 1.1.2015 – 31.12.2017
Annotation
Centre of Excelence for New Technologies in Electrical Engineering
Budovanie Centra excelentnosti pre nové technológie v elektrotechnike – II. etapa
Program: EU Structural Funds Research Development
Project leader: RNDr. Kostič Ivan
ID: ITMS – 262 401 200 19
Duration: 1.3.2010 – 28.2.2013
Web page: http://www.elu.sav.sk/old/cente/index.html
Center of Excellence for New Technologies in Electrical Engineering
Centrum excelentnosti pre nové technológie v elektrotechnike – I.etapa
Program: EU Structural Funds Research Development
Project leader: RNDr. Kostič Ivan
ID: ITMS – 26240120011
Duration: 15.5.2009 – 14.5.2011
Web page: http://www.elu.sav.sk/old/cente/index.html
Physics of Information
Fyzika informácie
Program:
Project leader: RNDr. Kostič Ivan
ID:
Duration: 1.1.2005 – 31.12.2008
Web page: http://www.quniverse.sk/cepi/
Hybrid Spintronic Nanostructures Controlled by Spin-Polarized Current
Hybridné spintronické štruktúry riadené spinovopolarizovaným prúdom
Program: SRDA
Project leader: RNDr. Kostič Ivan
ID: APVV-0173-06
Duration: 1.1.2007 – 30.4.2010
Web page: http://www.fu.sav.sk/?q=sk/projects#APVV
Annotation
Nanostructured thin-film materials and innovative technologies for MEMS gas and heavy metal sensors
Nanoštruktúrne tenkovrstvové materiály a inovatívne technológie pre MEMS senzory plynov a ťažkých kovov
Program: VEGA
Project leader: RNDr. Kostič Ivan
ID: 1/0828/16
Duration: 1.1.2016 – 31.12.2019
Annotation
Advanced MEMS chemical sensors for extreme conditions
Pokročilé MEMS chemické senzory pre extrémne podmienky
Program: SRDA
Project leader: RNDr. Kostič Ivan
ID: APVV-0655-07
Duration: 1.6.2008 – 31.12.2010
Web page: www.elu.sav.sk
Annotation
Preparation of \’active\’ tips for probe microscopy by MOCVD
Príprava \’aktívnych\’ hrotov sondovej mikroskopie metódou MOCVD
Program: SRDA
Project leader: RNDr. Kostič Ivan
ID: APVV-51-045705
Duration: 1.1.2007 – 31.10.2009
Web page: http://www.elu.sav.sk/apvv.html
Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthes
Technológia výroby matice paralelných inteligentných nosníkov – sondových platform pre analýzu a syntézu v nanometrovej oblasti
Program:
Project leader: RNDr. Kostič Ivan
ID:
Duration: 1.1.2009 – 31.12.2009
Annotation
Investigation of novel nanolithographic technologies
Výskum nových nanolitografických technológii
Program: VEGA
Project leader: Ing. Hrkút Pavol CSc.
ID: 2/0214/09
Duration: 1.1.2009 – 31.12.2011
Web page: www.ui.sav.sk/ebl
Annotation
Investigation of Novel Resist Materials for Next Generation Lithography
Výskum nových rezistových materiálov pre litografiu novej generácie
Program: VEGA
Project leader: Ing. Hrkút Pavol CSc.
ID: VEGA 2/6184/26
Duration: 1.1.2006 – 1.12.2008
(CRISIS)
Výskum a vývoj nových informačných technológií na predvídanie a riešenie krízových situácií a bezpečnosť obyvateľstva
Program: EU Structural Funds Research Development
Project leader: doc. Ing. Hluchý Ladislav CSc.
ID: ITMS 26240220060
Duration: 3.1.2011 – 31.12.2013

Actual and recent projects (annotations):

Finished projects (annotations):

Innovation of sub-micrometer electron beam lithography
Inovácia sub-mikrometrovej elektrónovej litografie
Annotation: The electron beam resist development simulation model development. Investigation of the numerical parameters of the lithographic process for direct electron lithography in the thin layer of the positive electron beam resist PMMA A2 (Microchem, Ltd) and the negative electron beam resist HSQ FOx-12 (Dow Corning) with the energy of electrons 20 keV.

Molecular-friendly processes for fabrication of molecular electronic devices
Kompatibilné molekulárne procesy pre prípravu molekulárnych elektronických obvodov
Annotation: The aim of this proposal is the development of a viable fabrication process of molecular logic devices based on self-assembled monolayers and the subsequent characterization of the produced devices. Specifically, we aim to produce a molecular switch, in which the gate metal and dielectric electrodes will be fabricated using processing steps that do not include either high thermal budget or wet conditions after the application of the molecular layer, i.e. we propose a process that has low risk of damaging the molecular layer.

Correlation of structure and magnetism in novel nanoscale magnetic particles
Korelácia štruktúry a magnetických vlastností nových magnetických nano častíc
Annotation: no description

Radical Innovation Maskless Nanolithography
Radikálna inovácia bezmaskovej nanolitografie
Annotation: The specific targeted research project RIMANA (Radical Innovation Maskless Nanolithography) aims to research and develop a key masklessnanolithography technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.RIMANA is driven by two global industrial needs:A maskless lithography (ML2) tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries),A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic).Both global industrial needs are addressed by the RIMANA project with the following overall S/T objectives and work plans:- Concept and realisation of new, highly-innovative compact APS (programmable Aperture Plate System), including higher-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm node and beyond.- Concept and realization of optical Data Path improvements to achieve higher data rates.- Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist.- Brainstorm of results with perspectives for potential industrial realisation.The key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and 200x reduction electron-optics,retaining ultimate resolution down to the nanometer scale, while minimising throughput-resolution trade-offs.The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadershipof IMS Nanofabrication AG, an SME with extensive experience in cutting-edge charged particle nanofabrication research and technology.RIMANA is harmonised completely with the FP6 strategic objective IST & NMP-3. In particular, RIMANA addresses the need for “maskless nano-patterningfor low to medium volume production for the 32 nm node and beyond”.

Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthesis
Technológia výroby matice paralelných inteligentných nosníkov –sondových platform pre analýzu a syntézu v nanometrovej oblasti
Annotation: Scanning proximity probes (SPP) are uniquely powerful tools for analysis, manipulation and bottom-up synthesis: they are capable of addressing and engineering surfaces at the atomic level and are the key to unlocking the full potential of Nanotechnology.Current SPP nanotools are limited to single probes with pitifully slow processing rates and, even at the research level, attempts at multiprobe systems have achieved only a 32 x 32 array. This could be a terminal limitation for the future of Nanotechnology, in particular for bottom-up manufacturing, with little prospect for economic throughputs, unless 2-dimensional massively parallel probe arrays can be realised.Such a development would revolutionise Nanotechnology, triggering an avalanche of new products and processes in a wide range of applications including surface chemistry, materials and the life-health industries. This ground-breaking technology development is the ambitious principal aim of this proposal. Generic massively parallel intelligent cantilever-probe platforms will be produced through a number of existing and ground-breaking techniques.The ultimate product will be a packaged VLSI NEMS-chip (Very Large Scale Integrated Nano Electro Mechanical System) incorporating 128×128 proximal probes, fully addressable with control and readout interconnects and advanced software.To validate this novel technology, a series of demonstrations are planned where relevant SMEs will use this technology to carry out sub-10 nm metrology for high throughput manufacturing. Furthermore selected key applications and the results will be used to educate and inform in support of the development of new nanotechnology processes and products.It is the aim of PRONANO that the new massively parallel scanning probe nanotools with VLSI ASNEMS (application specific nanoelectromechanical systems) chips inside should empower nanotechnologists and drive the rapid development of nanoscience, leading to new nanotechnology processes and their industrial exploitation. They will secure the future of nanotechnology with economic throughputs leading to new manufacturing industries.

Nano-structuring by Electron Beam Lithography for Sensor Application
Tvarovanie štruktúr pre senzorové aplikácie s využitím elektrónovej litografie
Annotation: The aim of the presented project is the development of method for patterning of nanostructures at nanometer dimensions. The application is focused on sensor development. Nanometer scale device fabrication rules require tight control of the developed polymer resist profile. Process simulation is a key tool for optimization of the obtained lithography results. The final aim is to use of research results for exposures of patterns at the dimensions region below 100 nm.

Robust Lithography of Submicron nad Nano-dimensional Structures
Výkonná litografia submikrometrových a nanometrových štruktúr
Annotation: This project is the continuation of the previous Slovak-Bulgarian RD cooperation project. The subject of the previous project was submicrometer e-beam lithography. In this project, experiments and simulations are extended to nanometer dimensions. Nanometer scale device fabrication rules require tight control of the developed polymer resist profile. Process simulation is a key tool for optimization of the obtained lithography results. The final aim is to use of research results for exposures of patterns at the dimensions region below 100 nm. The objectives of this project are:- joint publications, – active participation at conference EBT 2012 in Bulgaria and Apcom 2011 in Slovakia, – mutual use of special laboratory equipment e-beam lithograph ZBA series and Scanning Electron Microscopy at Slovak Academy of Sciences and AFM microscopy at Bulgarian Academy of Sciences,- research materials collection in the field of nanolithography for educational and popularization purposes.

Study of electron beam resists and patterning of nano-structures by electron beam lithography for gas sensor applications
Výskum elektrónových rezistov a príprava nanoštruktúr s využitím elektrónovej litografie vo výskume senzorov plynu
Annotation: The project goal is the development of method for patterning of nano-structures at nano-meter dimensions and improvement of the technology for electron beam lithography, improvement of the models and computer simulation tools. The application is focused on sensor development. The final aim is to use research results for exposures of patterns at the dimensions region below 100 nm. The aims of the collaboration are – common results obtaining (using expensive facilities in the II-SAS, simulation tools in the IE-BAS, accumulated teams’ experience); their presentation, establishment and recognition (common publications, conference attendances, join seminars, join international project); successful continuation, strengthening and broadening of our collaboration, including young scientists and PhD students.

Hybrid Spintronic Nanostructures Controlled by Spin-Polarized Current
Hybridné spintronické štruktúry riadené spinovopolarizovaným prúdom
Annotation: Project goal: Spintronic GMR and TMR nanopillars (lateral size (150nm) for current induced magnetization switching (CIMS) studies will be prepared and analyzed. GMR nanopillars will be prepared by UHV deposition and nanoparticles lift off lithography and electron beam lithography (EBL). Novel TMR nanopillars with embedded magnetic nanoparticles will be prepared by UHV evaporation, LB nanoparticles deposition and EBL. Magnetic configurations of nanopillars will be studied by scanning MOKE microscope. We will study correlation between nanopillar structure, interface roughness (vertical and lateral correlations) and Neel ferromagnetic coupling with magnetic and CIMS behavior with the aim to lower the switching current. Magnetization behaviour in situ by its spin polarized current switching will be analyzed by simultaneous simultaneous the R (dynamic) vs. current and Kerr rotation vs. H experiments.

Nanostructured thin-film materials and innovative technologies for MEMS gas and heavy metal sensors
Nanoštruktúrne tenkovrstvové materiály a inovatívne technológie pre MEMS senzory plynov a ťažkých kovov
Annotation: The aim of the project is basic research in the field of finding new progressive materials based on simple and mixed metal oxides as well as new base materials for microelectrode fields. Activities were focused on the preparation and research of the properties of thin In2O3, TiO2, NiO layers and their selected combinations, and such layers together with a submicrometer electrode system and a polyimide membrane based micromechanical platform which were integrated into MEMS gas detection sensors. Attention was also paid to the research of the pyrolytic carbon layer as a substrate for the Bi deposition, using a sensor that was include all 3 electrodes in a vertical configuration to determine heavy metals in aqueous synthetic solutions and real water samples. For such an integrated sensor, the measurement methodology were optimized by electrochemical solvent analysis and potentiometric stripping analysis.

Advanced MEMS chemical sensors for extreme conditions
Pokročilé MEMS chemické senzory pre extrémne podmienky
Annotation: Much efforts of the project research team will be made to introduce the new designed MEMS sensoric device in all its complexity and multidisciplinary basis. Therefore, besides the modelling and fabrication methods developed, much attention will be devoted to new methodology of sensing and detection and new non-conventional methods to analyze the basic thermo-mechanical properties of the MEMS device in both stationary dynamic process conditions.

Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthes
Technológia výroby matice paralelných inteligentných nosníkov – sondových platform pre analýzu a syntézu v nanometrovej oblasti
Annotation: Financial support of the Slovak Academy of Sciences for the 6FW project No. 515739 PRONANO to cover non-allovable finances, e.g. VAT.

Investigation of novel nanolithographic technologies
Výskum nových nanolitografických technológii
Annotation: The subject of the solving of the proposed project belongs to the area of development of new nanolithographical technologies and techniques which are a key technology in the fabrication of nanoelectronic circuits and nanosystems. New and progressive solutions in the nanotechnology development will play a crucial role in the production of circuits with element dimensions smaller than 50 nm, in nanophotonics, nanomagnetic devices, molecular nanotechnology, NEMS (nano-electro-mechanical systems) technologies and the like. Preparation of nanometrical structures on non-standard substrates by direct lithography with maximal alignment precision as well as membrane-masks preparation for ion-beam lithography are main area of the proposed project. To achieve this one needs to optimize expositions of suitable masking materials (resists), preparation of the data by using new algorithms and optimization of new technological processes of the structures preparation.