Department of Electron beam lithography
Leader: Ing. Mgr. Robert Andok, PhD.
Deputy Leader: RNDr. I. Kostič
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Department of Electron Beam Lithography has many years practical experience in microstructures and nanostructures patterning based on electron beam lithography.

The Department of Electron Beam Lithography has many years practical
experience in microstructures and nanostructures patterning based on
electron beam lithography.

Research priority of the Department of EBL:
Research in the field of methods concerning the preparation of nanometer
structures based on electron beam for a wide range of applications
associated with materials and nanotechnology research.

Basic reseach themes:
– Research of physical phenomena in electron beam lithography for the
structures of micrometer (150-900 nm) and nanometer dimensions (10-100
nm) in various thin layers.
– Research of resist materials sensitive to electron beam radiation.
– Lithographic process optimization and correlation of subsequent
technological processes such as plasma etching, and preparation of thin
layers using resist masks.

Research aim:
– Applications where nanometer production structures are exploited based
on the “top-down” method (lithography-etching) in the area of the
research specialization „Material Research and Nanotechnology“.
– The use of electron beam lithography for the research projects in the
field of materials and nanotechnology research.
– Patterning of structures for micorelectronics circuits prototypes.
– Patterning of structures for semiconductor thin film sensors.
– Patterning of structures for micro-electro-mechanical systems (MEMS).
– Fabrication of photomasks for UV and deep-UV photolithography.