Projects/International/PRONANO

 
RESEARCH PROJECT NAME

PRONANO: Technology for the Production of Massively Parallel Inelligent Cantilever - Probe Platforms for Nanoscale Analysis and Synthesis

 

 
DESCRIPTION

FP6, IP No. 515739, PRONANO  EU FW6

Status of Department of Electron Beam Lithography (II SAS) in the project: Partner

Principal investigator: Nanoworld Services GmbH, Erlangen and TU Ilmenau, Germany

Period: 01/2005 - 01/2009

Investigator II SAS: RNDr. Ivan Kostič

 
DETAILED INFORMATION

The aim of PRONANO that the new massively parallel scanning probe nanotools with VLSI ASNEMS (application specific nanoelectromechanical systems) chips inside should empower nanotechnologists and drive the rapid development of nanoscience, leading to new nanotechnology processes and their industrial exploitation. They will secure the future of nanotechnology with economic throughputs leading to new manufacturing industries.

 


Slovenský názov

Technológia výroby matice paralelných inteligentných nosníkov –sondových platform pre analýzu a syntézu v nanometrovej oblasti

Akronym

PRONANO

Evidenčné číslo projektu

515739

Začiatok: 01.04.2005 Koniec: 30.09.2010

Koordinátor projektu

Nanoworld Services GmbH, Nemecko

Program

6RP

Podprogram

Nanotechnologies and nano-sciences, knowledge-based multifunctional materials and new production processes and devices

Anotácia (EN)

Scanning proximity probes (SPP) are uniquely powerful tools for analysis, manipulation and bottom-up synthesis: they are capable of addressing and engineering surfaces at the atomic level and are the key to unlocking the full potential of Nanotechnology. Current SPP nanotools are limited to single probes with pitifully slow processing rates and, even at the research level, attempts at multiprobe systems have achieved only a 32 x 32 array. This could be a terminal limitation for the future of Nanotechnology, in particular for bottom-up manufacturing, with little prospect for economic throughputs, unless 2-dimensional massively parallel probe arrays can be realised. Such a development would revolutionise Nanotechnology, triggering an avalanche of new products and processes in a wide range of applications including surface chemistry, materials and the life-health industries. This ground-breaking technology development is the ambitious principal aim of this proposal. Generic massively parallel intelligent cantilever-probe platforms will be produced through a number of existing and ground-breaking techniques. The ultimate product will be a packaged VLSI NEMS-chip (Very Large Scale Integrated Nano Electro Mechanical System) incorporating 128x128 proximal probes, fully addressable with control and readout interconnects and advanced software. To validate this novel technology, a series of demonstrations are planned where relevant SMEs will use this technology to carry out sub-10 nm metrology for high throughput manufacturing. Furthermore selected key applications and the results will be used to educate and inform in support of the development of new nanotechnology processes and products. It is the aim of PRONANO that the new massively parallel scanning probe nanotools with VLSI ASNEMS (application specific nanoelectromechanical systems) chips inside should empower nanotechnologists and drive the rapid development of nanoscience, leading to new nanotechnology processes and their industrial exploitation. They will secure the future of nanotechnology with economic throughputs leading to new manufacturing industries.

Partnerské inštitúcie

Bulharsko: Microsystems Ltd.;Varna
Nemecko: TU Ilmenau;Ilmenau, Nanoworld Services GmbH;Erlangen, NaWoTec GmbH;Rossdorf, Infineon AG;Munich, Forschungszentrum Rossendorf e.V;Dresden, SIOS Meßtechnik GmbH;Ilmenau
Francúzsko: National Polytechnique de Lorraine;Vandoeuvre-les-Nancy;ID-MOS SA;Gradignan near Bordeaux,
Veľká Británia: Council for the Central Laboratory of the Research Councils;Chilton;Didcot
Švajčiarsko: Fondation Suisse pour la Recherche en Microtechnique;Neuchâtel
Poľsko: Wroclaw University of Technology;Wroclaw
Švédsko: Uppsala University;Uppsala

WWW stránka projektu

www.pronano.org


 
PARTNERS    
 
Prof. Dr. J.P.Reithmaier
 
Technische Physik, Universität Kassel
Heinrich-Plett-Str. 40
34109 Kassel, Germany
Tel: 0561-804-4586
Fax: 0561-804-4136 http://www.uni-kassel.de/
Dr. Ana Almansa Martin
 
Profactor Produktionsforschungs GbmH
Profactor Research and Solutions GmbH
Forschungszentrum
2444 Seibersdorf
Austria
www.profactor.at
Dr. Hans-Olof Blom
 
Uppsala University
Solid State Electronics
The Angstrom Laboratory
PO Box 256,
Uppsala 75105, Sweden
www.uu.se
Dr. Klaus Edinger
 
NaWoTec GmbH
A Carl Zeiss SMT AG Company
Industriestr. 1,
64380 Rossdorf
Germany
www.nawotec.com
 
 
Dr. Knut Hufeld
 
Infineon Technologies AG
AI TI FP
Balanstrasse 73,
81541 Munich
Germany
www.infineon.com
Dr. Ejaz Huq
 
CLRC Rutherford Appleton Laboratory

Chilton, Didcot,
Oxfordshire, OX11 0QX
United Kingdom
www.clrc.ac.uk
Mrs. Annette Locher
 
FSRM

Ruelle DuPeyrou 4
Neuchâtel, 2001
Switzerland
www.fsrm.ch
Dr. Jerzy Mielczarski
 
Inst. Nat. Polytechnique de Lorraine
LEM, INPL/CNRS
15 avenue du Charmois,
Vandoeuvre lés Nancy, 54501
France
www.inpl-nancy.fr
Dr. Nikolay Nikolov
 
Microsystems Ltd.
Bul. Levski,
Computer Centre "Risk Electronik"
9010 Varna, Bulgaria
Phone: +359 52 321998
Fax: +359 52 302534
www.mikrosistemi.com
 
Dr. Teodor P. Gotszalk
 
Wroclaw University of Technology
Institute of Microsystems Technology
ul. Janiszewskiego 11/17,
Wroclaw, 50-372
Poland
www.pwr.wroc.pl
Dr. Richard Pedreau
 
ID-MOS SA

ZA Favard - 16 Cours du General de Gaulle
Gradignan, 33170
France
www.id-mos.com
Dr. Bernd Schmidt
 
Forschungszentrum Dresden-Rossendorf
Institut für Ionenstrahlphysik und Materialforschung

01314 Dresden,
Germany
www.fz-rossendorf.de/fwi
Dr. Gerhard Schlüter
 
Vistec Semiconductor Systems GmbH

Kubacher Weg 4
35781 Weilburg
Germany
www.vistec-semi.com
Dr. Walter Schott
 
SIOS Meßtechnik GmbH

Am Vogelherd 46,
98693 Ilmenau
Germany
www.sios.de